JW

Jan Evert Van Der Werf

AB Asml Netherlands B.V.: 21 patents #189 of 3,192Top 6%
U.S. Philips: 11 patents #220 of 8,851Top 3%
AB Asm Lithography B.V.: 1 patents #15 of 53Top 30%
Overall (All Time): #108,854 of 4,157,543Top 3%
33
Patents All Time

Issued Patents All Time

Showing 26–33 of 33 patents

Patent #TitleCo-InventorsDate
5674650 Method of repetitively imaging a mask pattern on a substrate, and apparatus for performing the method Peter Dirksen 1997-10-07
5673101 Method of repetitively imaging a mask pattern on a substrate, and apparatus for performing the method Manfred Gawein Tenner, Cornelis M. J. Van Uijen, Peter Dirksen 1997-09-30
5485272 Radiation-source unit for generating a beam having two directions of polarisation and two frequencies Peter Dirksen, Manfred Gawein Tenner 1996-01-16
5191200 Imaging apparatus having a focus-error and/or tilt detection device Marinus Aart Van Den Brink, Henk F. D. Linders, Johannes Marcus Maria Beltman 1993-03-02
5026166 Apparatus for pre-aligning substrate preparatory to fine alignment 1991-06-25
4866262 Optical imaging arrangement comprising an opto-electronic focussing-error detection system Johannes W. M. Biesterbos 1989-09-12
4749278 Arrangement for aligning a mask and a substrate relative to each other 1988-06-07
4253019 Apparatus for reading an optical record carrier having a radiation-reflecting information structure Willem G. Opheij 1981-02-24