RL

Rendong Lin

Applied Materials: 1 patents #4,780 of 7,310Top 70%
CS Cadence Design Systems: 1 patents #1,216 of 2,263Top 55%
Overall (All Time): #1,883,340 of 4,157,543Top 50%
2
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
11067905 Real-time autofocus for maskless lithography on substrates Diana Valverde-Paniagua, Zhongchuan Zhang, Zheng Gu, Meenaradchagan Vishnu, Glen Gomes 2021-07-20
8326591 Synchronized envelope and transient simulation of circuits Qian Cai, Dan Feng, Bruce W. McGaughy, Jun Kong 2012-12-04