Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Real-time autofocus for maskless lithography on substrates

Real-time autofocus for maskless lithography on substrates

US Patent 11067905 · Granted Jul 20, 2021

Estimated economic value: $88,311,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Process, system, and software for maskless lithography systems2025
Harness connector2025
Safety plate for a harness2025
Safety device connector apparatus for use with a wearable safety harness2025
Wicking structure of 3D-knitted spacer fabric2025
Method for determining phase-state type and saturation of fluid in tight reservo2024
Bipolar time-to-digital converter2024
Harness connector2024
Pivot link2024
Harness2024
Harness relief step2024
Pivot link2023