Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7288156 | Methods for cleaning a substrate | Yoichi Isago, Kazuo Nojiri, Teruo Saito, Shu Nakajima | 2007-10-30 |
| 7004181 | Apparatus for cleaning a substrate | Yoichi Isago, Kazuo Nojiri, Teruo Saito, Shu Nakajima | 2006-02-28 |
| 5591494 | Deposition of silicon nitrides by plasma-enhanced chemical vapor deposition | Tatsuya Sato, Atsushi Tabata | 1997-01-07 |
| 5508067 | Deposition of silicon nitride by plasma-enchanced chemical vapor deposition | Tatsuya Sato, Atsushi Tabata | 1996-04-16 |
| 5129958 | Cleaning method for semiconductor wafer processing apparatus | Makoto Nagashima, Jerry Wong | 1992-07-14 |
| 4290188 | Process for producing bipolar semiconductor device utilizing predeposition of dopant and a polycrystalline silicon-gold film followed by simultaneous diffusion | Yoshito Ichinose, Takeshi Fukuda | 1981-09-22 |