Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12264168 | Ruthenium compound, thin-film forming raw material, and method of producing thin film | Masako HATASE, Keisuke Takeda | 2025-04-01 |
| 12104245 | Compound, thin-film forming raw material that contains said compound, and method of manufacturing thin film | Atsushi Sakurai, Masako HATASE, Keisuke Takeda, Ryota FUKUSHIMA, Atsushi Yamashita | 2024-10-01 |
| 11760771 | Ruthenium compound, raw material for forming thin film, and method for producing thin film | Tomoharu Yoshino, Nana OKADA, Masako HATASE | 2023-09-19 |
| 11408069 | Method for producing metallic ruthenium thin film by atomic layer deposition | Akihiro Nishida | 2022-08-09 |
| 10920313 | Diazadienyl compound, raw material for forming thin film, and method for manufacturing thin film | Tomoharu Yoshino, Akihiro Nishida, Atsushi Yamashita | 2021-02-16 |
| 10351584 | Alkoxide compound, raw material for forming thin film, method for manufacturing thin film, and alcohol compound | Atsushi Sakurai, Masako HATASE, Tomoharu Yoshino | 2019-07-16 |
| 10253408 | Compound, thin film-forming material, and thin film manufacturing method | Tomoharu Yoshino, Akihiro Nishida, Nana SUGIURA | 2019-04-09 |
| 10167304 | Ruthenium compound, material for thin film formation, and process for thin film formation | Masako HATASE, Atsushi Sakurai, Tomoharu Yoshino | 2019-01-01 |
| 10011623 | Alkoxide compound, thin film-forming starting material, and thin film formation method | Atsushi Sakurai, Masako HATASE, Tomoharu Yoshino | 2018-07-03 |
| 9994593 | Copper compound, starting material for forming thin film, and method for manufacturing thin film | Tomoharu Yoshino, Atsushi Sakurai, Akihiro Nishida, Makoto Okabe | 2018-06-12 |