Issued Patents 2025
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12396239 | Semiconductor device structure and methods of forming the same | — | 2025-08-19 |
| 12382654 | Semiconductor devices | Guan-Ren Wang, Ching-Feng Fu | 2025-08-05 |
| 12369293 | Conductive feature formation | — | 2025-07-22 |
| 12362239 | Self aligned contact scheme | — | 2025-07-15 |
| 12336236 | Semiconductor device isolation features | Guan-Ren Wang, Ching-Feng Fu | 2025-06-17 |
| 12310051 | Fin field-effect transistor device having contact plugs with re-entrant profile | Guan-Ren Wang, Ching-Feng Fu, Yun-Min Chang | 2025-05-20 |
| 12310043 | Method of fabricating a semiconductor device | Yi-Chen Lo, Li-Te Lin | 2025-05-20 |
| 12302626 | Asymmetric source/drain epitaxy | — | 2025-05-13 |
| 12293947 | Gap patterning for metal-to-source/drain plugs in a semiconductor device | Ching-Feng Fu, Huan-Just Lin, Fu-Sheng Li, Tsai-Jung Ho, Bor Chiuan Hsieh +2 more | 2025-05-06 |
| 12283527 | Methods of forming semiconductor device structures | — | 2025-04-22 |
| 12283625 | Manufacturing method of semiconductor device | — | 2025-04-22 |
| 12272731 | Middle-of-line interconnect structure and manufacturing method | Ching-Feng Fu, Huan-Just Lin | 2025-04-08 |
| 12268027 | Middle-of-line interconnect structure and manufacturing method | Ching-Feng Fu, Huan-Just Lin | 2025-04-01 |
| 12237419 | Gate structures in transistor devices and methods of forming same | Tze-Liang Lee, Jr-Hung Li, Chi-Hao Chang | 2025-02-25 |
| 12218242 | Semiconductor structure | — | 2025-02-04 |
| 12211924 | Semiconductor device and method of forming the same | Tze-Liang Lee, Jr-Hung Li, Chi-Hao Chang, Bor Chiuan Hsieh | 2025-01-28 |
| 12211937 | Field effect transistor device with air gap spacer in source/drain contact | Ching-Feng Fu, Guan-Ren Wang, Yun-Min Chang | 2025-01-28 |
| 12191206 | Method of manufacturing fin spacers having different heights using a polymer-generating etching process | — | 2025-01-07 |