Issued Patents 2025
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12374548 | Photoresist layer outgassing prevention | Yen-Yu Chen, Chih-Cheng Liu, Yi-Chen Kuo, Tze-Liang Lee, Ming-Hui Weng +1 more | 2025-07-29 |
| 12368098 | Methods of forming semiconductor device | Pei-Yu Chou, Liang-Yin Chen, Su-Hao Liu, Tze-Liang Lee, Meng-Han Chou +4 more | 2025-07-22 |
| 12322647 | Semiconductor devices and methods | Yu-Kai Lin, Po-Cheng Shih, Tze-Liang Lee | 2025-06-03 |
| 12324185 | Semiconductor device, FinFET device and methods of forming the same | Po-Hsien Cheng, Tai-Chun Huang, Tze-Liang Lee, Chung-Ting Ko, Jr-Yu Chen +1 more | 2025-06-03 |
| 12272554 | Method of manufacturing a semiconductor device | Jia-Lin WEI, Ming-Hui Weng, Chih-Cheng Liu, Yi-Chen Kuo, Yen-Yu Chen +4 more | 2025-04-08 |
| 12271113 | Method of manufacturing a semiconductor device | Chih-Cheng Liu, Yi-Chen Kuo, Jia-Lin WEI, Ming-Hui Weng, Yen-Yu Chen +4 more | 2025-04-08 |
| 12255240 | Topology selective and sacrificial silicon nitride layer for generating spacers for a semiconductor device drain | Tzu-Yang Ho, Tsai-Jung Ho, Tze-Liang Lee | 2025-03-18 |
| 12237419 | Gate structures in transistor devices and methods of forming same | Yu-Lien Huang, Tze-Liang Lee, Chi-Hao Chang | 2025-02-25 |
| 12222643 | Method of manufacturing a semiconductor device and pattern formation method | Chih-Cheng Liu, Ming-Hui Weng, Yahru Cheng, Chi-Ming Yang, Tze-Liang Lee +1 more | 2025-02-11 |
| 12218241 | Semiconductor device structure with etch stop layer for reducing RC delay | Chung-Ting Ko, Bo-Cyuan Lu, Chi On Chui | 2025-02-04 |
| 12211766 | Highly protective wafer edge sidewall protection layer | Su-Jen Sung, Tze-Liang Lee | 2025-01-28 |
| 12211924 | Semiconductor device and method of forming the same | Yu-Lien Huang, Tze-Liang Lee, Chi-Hao Chang, Bor Chiuan Hsieh | 2025-01-28 |