| 12402351 |
Gate all around device with fully-depleted silicon-on-insulator |
Ashish Pal, El Mehdi Bazizi, Myungsun Kim |
2025-08-26 |
| 12363948 |
Formation of gate all around device |
Myungsun Kim, Andy Lo, Eric Davey, Michael Stolfi |
2025-07-15 |
| 12334337 |
Integrated flowable low-k gap-fill and plasma treatment |
Myungsun Kim, Jingmei Liang, Martin Jay Seamons, Michael Stolfi |
2025-06-17 |
| 12327761 |
Void-free contact trench fill in gate-all-around FET architecture |
Nicolas L. Breil, Byeong-Chan Lee |
2025-06-10 |
| 12261047 |
Doping techniques |
Wolfgang Aderhold, Yi-Chiau Huang, Wei Liu, Abhilash J. Mayur |
2025-03-25 |
| 12249511 |
Treatments to improve device performance |
Steven C. H. Hung, Lin Dong, Johanes F. Swenberg, Linlin Wang |
2025-03-11 |
| 12243941 |
Conformal oxidation for gate all around nanosheet I/O device |
Myungsun Kim, Michael Stolfi, Andy Lo |
2025-03-04 |
