Issued Patents 2024
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12131914 | Selective etching with fluorine, oxygen and noble gas containing plasmas | Du Zhang, Hojin Kim, Kaoru Maekawa, Mingmei Wang, Jacques Faguet +4 more | 2024-10-29 |
| 12068171 | Method for etching oxide semiconductor film and plasma processing apparatus | Masahiro Yamazaki | 2024-08-20 |