Issued Patents 2024
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12183823 | Fin field-effect transistor with a gate structure having a dielectric protection layer | Chun-Neng Lin, Jian-Jou Lian | 2024-12-31 |
| 12183637 | Fin field-effect transistor and method of forming the same | Yu-Chi Pan, Kuo-Bin Huang, Ying-Liang Chuang, Yu-Te Su, Kuan-Wei Lin | 2024-12-31 |
| 12176422 | Controlling fin-thinning through feedback | Tsu-Hui Su, Chun-Hsiang Fan, Yu-Wen Wang, Kuo-Bin Huang | 2024-12-24 |
| 12136566 | Semiconductor device and method of manufacture | Yu-Shih Wang, Po-Nan Yeh, U-Ting Chiu, Chun-Neng Lin, Chia-Cheng Chen +2 more | 2024-11-05 |
| 12119390 | Gate spacer structures and methods for forming the same | Chun Hsiung Tsai, Clement Hsingjen Wann, Kuo-Feng Yu, Shahaji B. More, Yu-Ming Lin | 2024-10-15 |
| 12080556 | Fin field-effect transistor and method of forming the same | Tzu-Ang Chiang, Chun-Neng Lin, Jian-Jou Lian, Po-Yuan Wang, Chieh-Wei Chen | 2024-09-03 |
| 12074035 | Method for partially removing tungsten in semiconductor manufacturing process | Chia-Ling Chung, Chun-Chih Cheng, Ying-Liang Chuang, Kuo-Bin Huang | 2024-08-27 |
| 12068385 | Oxidation to mitigate dry etch and/or wet etch fluorine residue | U-Ting Chiu, Chun-Cheng Chou, Chi-Shin Wang, Chun-Neng Lin | 2024-08-20 |
| 12051626 | Fin Field-Effect transistor and method of forming the same | Chun-Cheng Chou, Ying-Liang Chuang, Chun-Neng Lin, Kuo-Bin Huang | 2024-07-30 |
| 12051753 | Fin field-effect transistor device having hybrid work function layer stack | Chun-Neng Lin, Hung-Chin Chung, Hsin-Yun Hsu | 2024-07-30 |
| 12051619 | Semiconductor device and method of manufacture | Yu-Shih Wang, Po-Nan Yeh, U-Ting Chiu, Chun-Neng Lin, Chia-Cheng Chen +2 more | 2024-07-30 |
| 12046476 | Wet etching chemistry and method of forming semiconductor device using the same | Meng Li, Ying-Chuen Wang, Chieh-Yi Shen, Li-Min Chen, Kuo-Bin Huang | 2024-07-23 |
| 12021145 | Fin field-effect transistor device having hybrid work function layer stack | Chun-Neng Lin, Hung-Chin Chung, Hsin-Yun Hsu | 2024-06-25 |
| 12015077 | Metal gate using monolayers | Ju-Li Huang, Chun-Sheng Liang, Ming-Chi Huang, Ying-Liang Chuang, Hsin-Che Chiang | 2024-06-18 |
| 11996470 | Fin field-effect transistor and method of forming the same | Jian-Jou Lian, Tzu-Ang Chiang, Chun-Neng Lin, Po-Yuan Wang, Chieh-Wei Chen | 2024-05-28 |
| 11996324 | Conductive feature of a semiconductor device and method of forming same | U-Ting Chiu, Po-Nan Yeh, Yu-Shih Wang, Chun-Neng Lin | 2024-05-28 |
| 11978801 | Fin field-effect transistor device and method of forming the same | Jian-Jou Lian, Chun-Neng Lin, Chieh-Wei Chen, Tzu-Ang Chiang | 2024-05-07 |
| 11972982 | Method of manufacturing a semiconductor device | Chun Hsiung Tsai, Yu-Ming Lin, Kuo-Feng Yu, Shahaji B. More, Chandrashekhar Prakash Savant +2 more | 2024-04-30 |
| 11923428 | Fin field-effect transistor and method of forming the same | Yu-Chi Pan, Ying-Liang Chuang, Kuo-Bin Huang | 2024-03-05 |
| 11923437 | Controlling fin-thinning through feedback | Tsu-Hui Su, Chun-Hsiang Fan, Yu-Wen Wang, Kuo-Bin Huang | 2024-03-05 |
| 11923201 | Self-protective layer formed on high-K dielectric layer | Ju-Li Huang, Ying-Liang Chuang, Kuo-Bin Huang | 2024-03-05 |
| 11901441 | Fin field-effect transistor and method of forming the same | Jian-Jou Lian, Tzu-Ang Chiang, Chun-Neng Lin, Po-Yuan Wang, Chieh-Wei Chen | 2024-02-13 |
| 11901180 | Method of breaking through etch stop layer | Yu-Shih Wang, Hong-Jie Yang, Chia-Ying Lee, Po-Nan Yeh, U-Ting Chiu +2 more | 2024-02-13 |