Issued Patents 2024
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12166035 | FinFET with bowl-shaped gate isolation and method | Wan-Chen Hsieh, Tai-Chun Huang | 2024-12-10 |
| 12166076 | Semiconductor device and methods of forming the same | Jen-Hong Chang, Yi-Hsiu Liu, You-Ting Lin, Chih-Chung Chang, Kuo-Yi Chao +4 more | 2024-12-10 |
| 12125911 | Method of modulating stress of dielectric layers | Han-Chi Lin, Chunyao Wang, Ching-Yu Huang, Tze-Liang Lee, Yung-Chih Wang | 2024-10-22 |
| 12113113 | Semiconductor device with a core-shell feature and method for forming the same | Chih-Chung Chang, Sung-En Lin, You-Ting Lin, Yi-Hsiu Liu, Po-Wei Liang +5 more | 2024-10-08 |
| 12112988 | Hybrid isolation regions having upper and lower portions with seams | Chi On Chui | 2024-10-08 |
| 12112942 | Deposition process for forming semiconductor device and system | Chi On Chui | 2024-10-08 |
| 12094784 | Method for manufacturing semiconductor device | Sung-En Lin, Chi On Chui | 2024-09-17 |
| 12087834 | Semiconductor structure | Shih-Wen Huang, Hong-Hsien Ke, Chia-Hui Lin, Tai-Chun Huang | 2024-09-10 |
| 12087641 | Method for forming semiconductor structure with fins using a multilayer mask structure for etching to form nanostructures | Wen-Ju Chen, Tai-Chun Huang | 2024-09-10 |
| 12080553 | Semiconductor device and method of manufacture | Sung-En Lin, Chi On Chui | 2024-09-03 |
| 12062578 | Prevention of contact bottom void in semiconductor fabrication | Yun Lee, Chen-Ming Lee, Mei-Yun Wang, Fu-Kai Yang | 2024-08-13 |
| 12051700 | Semiconductor device and method | Li-Fong Lin, Wan-Chen Hsieh, Tai-Chun Huang | 2024-07-30 |
| 12027423 | Forming isolation regions for separating fins and gate stacks | Tai-Chun Huang, Jr-Hung Li, Tze-Liang Lee, Chi On Chui | 2024-07-02 |
| 11984485 | Semiconductor device, FinFET device and methods of forming the same | Po-Hsien Cheng, Jr-Hung Li, Tai-Chun Huang, Tze-Liang Lee, Jr-Yu Chen +1 more | 2024-05-14 |
| 11948843 | Method for forming hardmask formation by hybrid materials in semiconductor device | Sung-En Lin, Chi On Chui | 2024-04-02 |
| 11888049 | Dielectric isolation structure for multi-gate transistors | Jen-Hong Chang, Yuan-Ching Peng, Kuo-Yi Chao, Chia-Cheng Chao, You-Ting Lin +4 more | 2024-01-30 |