Issued Patents 2024
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11914306 | Predicting defect rate based on lithographic model parameters | Erik Verduijn, Ulrich Klostermann, Jiuzhou Tang, Hans-Jürgen Stock | 2024-02-27 |
| 11900042 | Stochastic-aware lithographic models for mask synthesis | Kevin Lucas, Yudhishthir Prasad Kandel, Ulrich Klostermann, Zachary Adam Levinson | 2024-02-13 |