Issued Patents 2024
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12057295 | RF power compensation to reduce deposition or etch rate changes in response to substrate bulk resistivity variations | Wei Luo, Youn Gi Hong, WeiWu ZHONG | 2024-08-06 |
| 11967486 | Substrate processing system including dual ion filter for downstream plasma | Andrew Stratton Bravo, Chih-Hsun Hsu, Serge Kosche, Stephen Whitten, Shih-Chung Kon +3 more | 2024-04-23 |