Issued Patents 2024
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12091749 | Method for epitaxially depositing a material on a substrate by flowing a process gas across the substrate from an upper gas inlet to an upper gas outlet and flowing a purge gas from a lower gas inlet to a lower gas outlet | Tetsuya Ishikawa, Swaminathan Srinivasan, Matthias Bauer, Ala Moradian, Kartik Shah +4 more | 2024-09-17 |
| 12060651 | Chamber architecture for epitaxial deposition and advanced epitaxial film applications | Tetsuya Ishikawa, Swaminathan Srinivasan, Kartik Shah, Ala Moradian, Matthias Bauer +2 more | 2024-08-13 |
| 12018372 | Gas injector for epitaxy and CVD chamber | Tetsuya Ishikawa, Swaminathan Srinivasan, Matthias Bauer, Ala Moradian, Kartik Shah +4 more | 2024-06-25 |