Issued Patents 2023
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11548844 | Monomer, polymer, negative resist composition, photomask blank, and resist pattern forming process | Masayoshi Sagehashi, Masaaki Kotake, Naoya Inoue, Keiichi Masunaga, Satoshi Watanabe | 2023-01-10 |