Issued Patents 2023
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11852970 | Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin | Hiroto KUDO, Takumi TOIDA, Takashi Sato | 2023-12-26 |
| 11747728 | Compound, resin, composition, resist pattern formation method, circuit pattern formation method and method for purifying resin | Junya HORIUCHI, Yu Okada, Takashi MAKINOSHIMA | 2023-09-05 |
| 11572430 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | Takumi TOIDA, Youko Shimizu, Takashi MAKINOSHIMA, Takashi Sato | 2023-02-07 |