Issued Patents 2023
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11783110 | Method for reticle enhancement technology of a design pattern to be manufactured on a substrate | Akira Fujimura, P. Jeffrey Ungar | 2023-10-10 |
| 11756765 | Method and system for determining a charged particle beam exposure for a local pattern density | Akira Fujimura, Harold Robert Zable, Abhishek Shendre, William E. Guthrie, Ryan Pearman | 2023-09-12 |
| 11693306 | Method for reticle enhancement technology of a design pattern to be manufactured on a substrate | Akira Fujimura, P. Jeffrey Ungar | 2023-07-04 |
| 11604451 | Method and system of reducing charged particle beam write time | Akira Fujimura, Harold Robert Zable, Abhishek Shendre, William E. Guthrie, Ryan Pearman | 2023-03-14 |
| 11592802 | Method and system of reducing charged particle beam write time | Akira Fujimura, Harold Robert Zable, William E. Guthrie, Ryan Pearman | 2023-02-28 |