AF

Akira Fujimura

D2 D2S: 5 patents #1 of 8Top 15%
📍 Saratoga, CA: #65 of 590 inventorsTop 15%
🗺 California: #4,226 of 67,585 inventorsTop 7%
Overall (2023): #34,853 of 537,848Top 7%
5
Patents 2023

Issued Patents 2023

Showing 1–5 of 5 patents

Patent #TitleCo-InventorsDate
11783110 Method for reticle enhancement technology of a design pattern to be manufactured on a substrate P. Jeffrey Ungar, Nagesh Shirali 2023-10-10
11756765 Method and system for determining a charged particle beam exposure for a local pattern density Harold Robert Zable, Nagesh Shirali, Abhishek Shendre, William E. Guthrie, Ryan Pearman 2023-09-12
11693306 Method for reticle enhancement technology of a design pattern to be manufactured on a substrate P. Jeffrey Ungar, Nagesh Shirali 2023-07-04
11604451 Method and system of reducing charged particle beam write time Harold Robert Zable, Nagesh Shirali, Abhishek Shendre, William E. Guthrie, Ryan Pearman 2023-03-14
11592802 Method and system of reducing charged particle beam write time Harold Robert Zable, Nagesh Shirali, William E. Guthrie, Ryan Pearman 2023-02-28