TW

Toshiharu Wada

TL Tokyo Electron Limited: 2 patents #123 of 896Top 15%
📍 Rifu, NY: #2 of 3 inventorsTop 70%
Overall (2022): #102,196 of 548,613Top 20%
2
Patents 2022

Issued Patents 2022

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
11537049 Method of line roughness improvement by plasma selective deposition Chia-Yun Hsieh, Akiteru Ko 2022-12-27
11276572 Technique for multi-patterning substrates 2022-03-15