Issued Patents 2022
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11393674 | Forming low-stress silicon nitride layer through hydrogen treatment | Ching-Yu Huang, Hsin-Hao Yeh, Chunyao Wang, Tze-Liang Lee | 2022-07-19 |
| 11380776 | Field-effect transistor device with gate spacer structure | Chunyao Wang | 2022-07-05 |