Issued Patents 2022
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11393674 | Forming low-stress silicon nitride layer through hydrogen treatment | Wei-Che Hsieh, Ching-Yu Huang, Chunyao Wang, Tze-Liang Lee | 2022-07-19 |
| 11296225 | FinFET device and method of forming same | Fu-Ting Yen | 2022-04-05 |