Issued Patents 2022
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11532728 | Method semiconductor device fabrication with improved epitaxial source/drain proximity control | Fu-Tsun Tsai, Tong Jun Huang, Chi-Cherng Jeng | 2022-12-20 |
| 11527406 | Trench etching process for photoresist line roughness improvement | Sheng-Lin Hsieh, Ching-Pei Hsieh, Kuan-Jung Chen | 2022-12-13 |
| 11437495 | Semiconductor device and method of manufacturing the same | Ru-Shang Hsiao, Ching-Pin Lin, Chih-Mu Huang, Fu-Tsun Tsai | 2022-09-06 |
| 11404413 | Semiconductor device and manufacturing method thereof | Kuan-Jung Chen, Chih-Mu Huang, Kai-Di Wu, Ming-Feng Lee, Ting-Chun Kuan | 2022-08-02 |
| 11276638 | Back end of line via to metal line margin improvement | Yi-Chun Huang, Chun-Wei Kuo | 2022-03-15 |
| 11271111 | Source/drain structure with barrier in FinFET device and method for forming the same | Ting-Chun Kuan, Chih-Mu Huang, Fu-Tsun Tsai, Sheng-Lin Hsieh, Kuan-Jung Chen | 2022-03-08 |