Issued Patents 2022
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11527444 | Air spacer formation for semiconductor devices | Wei-Lun Min | 2022-12-13 |
| 11450741 | Doping for semiconductor device with conductive feature | Su-Hao Liu, Huicheng Chang, Chia-Cheng Chen, Liang-Yin Chen, Kuo-Ju Chen +4 more | 2022-09-20 |
| 11444179 | Isolation structures in multi-gate semiconductor devices and methods of fabricating the same | Xusheng Wu, Huiling Shang | 2022-09-13 |
| 11430890 | Integrated circuits with channel-strain liner | Xusheng Wu, Huiling Shang | 2022-08-30 |
| 11387146 | Semiconductor device with air gaps between metal gates and method of forming the same | Wei-Lun Min, Xusheng Wu | 2022-07-12 |
| 11362217 | Method of forming transistors of different configurations | Wei-Lun Min | 2022-06-14 |
| 11355615 | FinFET having fluorine-doped gate sidewall spacers | Wei-Lun Min, Xu-Sheng Wu | 2022-06-07 |
| 11302784 | Semiconductor device having contact feature and method of fabricating the same | Xusheng Wu, Ying-Keung Leung, Huiling Shang, Youbo Lin | 2022-04-12 |
| 11277360 | Generic disambiguation | Jing Chen, Ye-Kui Wang, Jiang Chen | 2022-03-15 |