Issued Patents 2022
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11527444 | Air spacer formation for semiconductor devices | Chang-Miao Liu | 2022-12-13 |
| 11387146 | Semiconductor device with air gaps between metal gates and method of forming the same | Xusheng Wu, Chang-Miao Liu | 2022-07-12 |
| 11362217 | Method of forming transistors of different configurations | Chang-Miao Liu | 2022-06-14 |
| 11355615 | FinFET having fluorine-doped gate sidewall spacers | Chang-Miao Liu, Xu-Sheng Wu | 2022-06-07 |