Issued Patents 2022
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11467485 | Blankmask and photomask for extreme ultraviolet lithography | Cheol Shin, Jong-Hwa Lee, Gil-Woo KONG, Gyeong-Won SEO | 2022-10-11 |
| 11435661 | Reflective type blankmask for EUV, and method for manufacturing the same | Gil-Woo KONG | 2022-09-06 |
| 11360377 | Half-tone attenuated phase shift blankmask and photomask for EUV lithography | Cheol Shin, Jong-Hwa Lee, See-Jun Jeong | 2022-06-14 |