Issued Patents 2021
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11180678 | Suppressing SiN removal rates and reducing oxide trench dishing for Shallow Trench Isolation (STI) process | Xiaobo Shi, Krishna P. Murella, Hongjun Zhou, Mark Leonard O'Neill | 2021-11-23 |
| 11111415 | Chemical mechanical planarization of films comprising elemental silicon | James M. Henry, Hongjun Zhou, Krishna P. Murella, Dnyanesh Chandrakant Tamboli | 2021-09-07 |
| 11078417 | Low oxide trench dishing chemical mechanical polishing | Xiaobo Shi, Krishna P. Murella, Hongjun Zhou, Mark Leonard O'Neill | 2021-08-03 |
| 11072726 | Low oxide trench dishing chemical mechanical polishing | Xiaobo Shi, Krishna P. Murella, Hongjun Zhou, Mark Leonard O'Neill | 2021-07-27 |