Issued Patents 2021
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11101354 | Method for forming semiconductor device structure with metal silicide layer | Gulbagh Singh, Chin-Nan Chang, Chih-Ming Lee, Chi-Yen Lin | 2021-08-24 |
| 10957762 | Manufacturing method of semiconductor device including conductive structure | Te-Chang Hsu, Che-Hsien Lin, Chun-Jen Huang, Yu-Chih Su, Yao-Jhan Wang | 2021-03-23 |
| 10892365 | Fin field effect transistor having crystalline titanium germanosilicide stressor layer | Te-Chang Hsu, Chun-Jen Huang, Che-Hsien Lin, Yao-Jhan Wang | 2021-01-12 |