Issued Patents 2021
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11145650 | Gate cut dielectric feature and method of forming the same | Xusheng Wu, Huiling Shang | 2021-10-12 |
| 11139432 | Methods of forming a FinFET device | Bwo-Ning Chen, Kei-Wei Chen | 2021-10-05 |
| 11133386 | Multi-layer fin structure | Bwo-Ning Chen, Xusheng Wu | 2021-09-28 |
| 11121236 | Semiconductor device with air spacer and stress liner | Xusheng Wu, Huiling Shang | 2021-09-14 |
| 11107736 | Gate structures for semiconductor devices | Chun-Fai Cheng, Kuan-Chung Chen | 2021-08-31 |
| 11081401 | Semiconductor device and method for manufacturing the same | Bwo-Ning Chen, Xu-Sheng Wu | 2021-08-03 |
| 11075283 | Dielectric constant reduction of gate spacer | Xu-Sheng Wu, Hui-Ling SHANG | 2021-07-27 |
| 11037048 | Virtual conversation method or system | Ye-Kui Wang, Jing Chen, Jiang Chen | 2021-06-15 |