Issued Patents 2021
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11145650 | Gate cut dielectric feature and method of forming the same | Chang-Miao Liu, Huiling Shang | 2021-10-12 |
| 11133386 | Multi-layer fin structure | Bwo-Ning Chen, Chang-Miao Liu | 2021-09-28 |
| 11121236 | Semiconductor device with air spacer and stress liner | Chang-Miao Liu, Huiling Shang | 2021-09-14 |
| 11094821 | Transistor structure and method with strain effect | Youbo Lin | 2021-08-17 |
| 11081398 | Method and structure to provide integrated long channel vertical FinFet device | David Paul Brunco | 2021-08-03 |