Issued Patents 2021
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11086223 | Hardmask composition and method of forming pattern using the hardmask composition | Hyeonjin Shin, Sangwon Kim, Seongjun Park, Yeonchoo Cho | 2021-08-10 |
| 11034847 | Hardmask composition, method of forming pattern using hardmask composition, and hardmask formed from hardmask composition | Sangwon Kim, Hyeonjin Shin, Dongwook LEE, Seongjun Park, Yunseong LEE +2 more | 2021-06-15 |
| 10928723 | Pellicle for photomask, reticle including the same, and exposure apparatus for lithography | Hyeonjin Shin, Hyunjae Song, Seongjun Park, Keunwook Shin, Changseok LEE +3 more | 2021-02-23 |