Issued Patents 2021
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11099483 | Euv lithography system for dense line patterning | Donis Flagello, Stephen P. Renwick, Daniel Gene Smith, Michael Binnard | 2021-08-24 |
| 11054745 | Illumination system with flat 1D-patterned mask for use in EUV-exposure tool | Daniel Gene Smith | 2021-07-06 |
| 11049409 | Systems and methods for treatment of aberrant responses | Mo Zhang, Jing Chen, Andre Alexander Rupp | 2021-06-29 |
| 10890849 | EUV lithography system for dense line patterning | Donis Flagello, Stephen P. Renwick, Daniel Gene Smith, Michael Binnard | 2021-01-12 |