TT

Tetsumasa Takaichi

Merck: 2 patents #121 of 909Top 15%
📍 Kakegawa, JP: #6 of 69 inventorsTop 9%
Overall (2021): #106,080 of 548,734Top 20%
2
Patents 2021

Issued Patents 2021

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
11163233 Chemically amplified positive type photoresist composition and pattern forming method using the same Masato Suzuki, Shunji Kawato, Kazumichi Akashi 2021-11-02
11029599 Chemically amplified positive photoresist composition and pattern forming method using same Shunji Kawato, Masato Suzuki, Kazumichi Akashi, Tomohide KATAYAMA 2021-06-08