SK

Shunji Kawato

Merck: 2 patents #121 of 909Top 15%
Overall (2021): #113,076 of 548,734Top 25%
2
Patents 2021

Issued Patents 2021

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
11163233 Chemically amplified positive type photoresist composition and pattern forming method using the same Masato Suzuki, Tetsumasa Takaichi, Kazumichi Akashi 2021-11-02
11029599 Chemically amplified positive photoresist composition and pattern forming method using same Tetsumasa Takaichi, Masato Suzuki, Kazumichi Akashi, Tomohide KATAYAMA 2021-06-08