Issued Patents 2021
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11056322 | Method and apparatus for determining process rate | Luc Albarede, Andrew D. Bailey, III, Jorge Luque, Seonkyung Lee, Thorsten Lill | 2021-07-06 |
| 10930478 | Apparatus with optical cavity for determining process rate | Jagadeeshwari MANNE, Luc Albarede | 2021-02-23 |
| 10903050 | Endpoint sensor based control including adjustment of an edge ring parameter for each substrate processed to maintain etch rate uniformity | Luc Albarede | 2021-01-26 |