Issued Patents 2021
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11048174 | Method of controlling a patterning process, lithographic apparatus, metrology apparatus lithographic cell and associated computer program | Michael Kubis, Marinus Jochemsen, Richard S. Wise, Girish Dixit, Liesbeth REIJNEN +3 more | 2021-06-29 |
| 11031244 | Modification of SNO2 surface for EUV lithography | Akhil Singhal, Dustin Zachary Austin | 2021-06-08 |