SL

Scott Lefevre

TL Tokyo Electron Limited: 1 patents #275 of 787Top 35%
Overall (2021): #270,721 of 548,734Top 50%
1
Patents 2021

Issued Patents 2021

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
10971372 Gas phase etch with controllable etch selectivity of Si-containing arc or silicon oxynitride to different films or masks Subhadeep Kal, Nihar Mohanty, Angelique Raley, Aelan Mosden 2021-04-06