Issued Patents 2021
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11011388 | Plasma apparatus for high aspect ratio selective lateral etch using cyclic passivation and etching | Kwame Eason, Pilyeon Park, Mark Kawaguchi, Seung Ho Park | 2021-05-18 |