Issued Patents 2021
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11011388 | Plasma apparatus for high aspect ratio selective lateral etch using cyclic passivation and etching | Kwame Eason, Mark Kawaguchi, Seung Ho Park, Hsiao-Wei Chang | 2021-05-18 |
PP
Pilyeon Park
Overall (2021): #300,284 of 548,734Top 55%
1
Patents 2021