Issued Patents 2021
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11031466 | Method of forming oxygen inserted Si-layers in power semiconductor devices | Martin Poelzl, Robert Haase, Maximilian Roesch, Andreas Meiser, Bernhard Goller +1 more | 2021-06-08 |
| 11031479 | Semiconductor device with different gate trenches | Britta Wutte | 2021-06-08 |