AA

Ali Afzali-Ardakani

IBM: 13 patents #288 of 11,638Top 3%
📍 Ossining, NY: #7 of 91 inventorsTop 8%
🗺 New York: #186 of 12,766 inventorsTop 2%
Overall (2021): #5,085 of 548,734Top 1%
13
Patents 2021

Issued Patents 2021

Showing 1–13 of 13 patents

Patent #TitleCo-InventorsDate
11205754 Formation of carbon nanotube-containing devices Bharat Kumar, George S. Tulevski 2021-12-21
11205800 Polymer and molten ion conductive salt and silicon interface for decreased interfacial resistance John Collins, Teodor K. Todorov, Joel P. de Souza, Devendra K. Sadana 2021-12-21
11189798 Formation of carbon nanotube-containing devices Bharat Kumar, George S. Tulevski 2021-11-30
11187672 Superhydrophobic electrode and biosensing device using the same Karthik Balakrishnan, Stephen W. Bedell, Pouya Hashemi, Bahman Hekmatshoartabari, Alexander Reznicek 2021-11-30
11176995 Cross-point array of polymer junctions with individually-programmed conductances James B. Hannon 2021-11-16
11145801 Adhesion layer to enhance encapsulation of superconducting devices Richard A. Haight, Vivekananda P. Adiga, Martin O. Sandberg, Hanhee Paik 2021-10-12
11127987 Evaporated ion conductive layer for decreased interfacial resistance/impedance at silicon based electrode interface John Collins, Teodor K. Todorov, Joel P. de Souza, Devendra K. Sadana 2021-09-21
11127903 Formation of carbon nanotube-containing devices Bharat Kumar, George S. Tulevski 2021-09-21
11079377 Nanopore coating for sensing chemical bond formation Priscilla Rogers, Stefan Harrer, Jose Miguel Lobez Comeras, Sung-Cheol Kim, Natalie Gunn 2021-08-03
11043270 SoC package with integrated ultraviolet light source Frank R. Libsch, James B. Hannon 2021-06-22
11024803 Methods for fabricating artificial neural networks (ANN) based on doped semiconductor resistive random access memory (RRAM) elements Matthew W. Copel, James B. Hannon, Satoshi Oida 2021-06-01
11024512 Selective etch formulation for silicon oxide Benjamin Wymore, David L. Rath, George G. Totir 2021-06-01
11002730 Molecular design to suppress desorption of self-assembled monolayers Bharat Kumar, Sufi Zafar 2021-05-11