Issued Patents 2021
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11061331 | Method for determining a structure-independent contribution of a lithography mask to a fluctuation of the linewidth | Markus Koch, Renzo Capelli, Martin Dietzel | 2021-07-13 |
| 10948637 | Metrology system having an EUV optical unit | Stefan Mueller, Ralf Gehrke | 2021-03-16 |