Issued Patents 2021
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11114350 | Method for removing photoresist from photomask substrate | Banqiu Wu, Eli DAGAN | 2021-09-07 |
| 10962889 | Method and apparatus for high throughput photomask curing | Banqiu Wu, Eli DAGAN, Bruce J. Fender | 2021-03-30 |
| 10928724 | Attachment feature removal from photomask in extreme ultraviolet lithography application | Banqiu Wu, Eli DAGAN, Bruce J. Fender | 2021-02-23 |