Issued Patents 2021
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11114350 | Method for removing photoresist from photomask substrate | Banqiu Wu, Khalid Makhamreh | 2021-09-07 |
| 11054746 | Portion of layer removal at substrate edge | Banqiu Wu | 2021-07-06 |
| 10962889 | Method and apparatus for high throughput photomask curing | Banqiu Wu, Khalid Makhamreh, Bruce J. Fender | 2021-03-30 |
| 10933624 | Photomask pellicle glue residue removal | Banqiu Wu | 2021-03-02 |
| 10928724 | Attachment feature removal from photomask in extreme ultraviolet lithography application | Banqiu Wu, Khalid Makhamreh, Bruce J. Fender | 2021-02-23 |