Issued Patents 2020
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10879129 | Self-aligned nanowire formation using double patterning | Ching-Feng Fu, De-Fang Chen, Yu-Chan Yen, Chia-Ying Lee, Huan-Just Lin | 2020-12-29 |
| 10854728 | Vertical device having a protrusion structure | De-Fang Chen, Teng-Chun Tsai, Cheng-Tung Lin, Li-Ting Wang, Ming-Ching Chang +1 more | 2020-12-01 |
| 10847409 | Semiconductor device and method | Shiang-Bau Wang | 2020-11-24 |
| 10748768 | Method for mandrel and spacer patterning | Yu-Chao Lin, Chao-Cheng Chen, Yu-Lung Yang | 2020-08-18 |
| 10665457 | Method of forming an integrated circuit using a patterned mask layer | Tzu-Yen Hsieh, Ming-Ching Chang, Yih-Ann Lin, De-Fang Chen, Chao-Cheng Chen | 2020-05-26 |