Issued Patents 2020
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10815572 | Chemically amplified positive resist composition and pattern forming process | Yoshinori Hirano, Satoshi Asai | 2020-10-27 |
| 10816900 | Tetracarboxylic acid diester compound, polymer of polyimide precursor and method for producing same, negative photosensitive resin composition, patterning process, and method for forming cured film | Hiroyuki Urano, Masashi Iio, Koji Hasegawa, Kenji Funatsu | 2020-10-27 |