Issued Patents 2020
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10551739 | Resist composition, and resist film, pattern forming method, and method for manufacturing electronic device, each using resist composition | Akira Takada, Shuji Hirano, Naoya SHIMOJU, Toshiya Takahashi | 2020-02-04 |
| 10526266 | Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, mask blank provided with actinic ray-sensitive or radiation-sensitive film, photomask, pattern forming method, method for manufacturing electronic device, electronic device, compound, and method for producing compound | Natsumi Yokokawa, Koutarou Takahashi, Shuhei Yamaguchi | 2020-01-07 |