TO

Toshiyuki Oie

MC Mitsubishi Gas Chemical Company: 4 patents #14 of 165Top 9%
📍 Katsushika, JP: #4 of 16 inventorsTop 25%
Overall (2020): #42,383 of 565,922Top 8%
4
Patents 2020

Issued Patents 2020

Showing 1–4 of 4 patents

Patent #TitleCo-InventorsDate
10689573 Wet etching composition for substrate having SiN layer and Si layer and wet etching method using same Akinobu HORITA, Kenji Shimada, Kenichi Takahashi, Aya Ito 2020-06-23
10651028 Semiconductor element cleaning solution that suppresses damage to tungsten-containing materials, and method for cleaning semiconductor element using same Kenji Shimada 2020-05-12
10629426 Semiconductor element cleaning solution that suppresses damage to cobalt, and method for cleaning semiconductor element using same Kenji Shimada 2020-04-21
10538718 Cleaning solution and cleaning method for material comprising carbon-incorporated silicon oxide for use in recycling wafer Kenji Shimada 2020-01-21