TW

Te-Chun Wang

RH Rohm And Haas Electronic Materials Cmp Holdings: 1 patents #19 of 40Top 50%
Overall (2020): #250,158 of 565,922Top 45%
1
Patents 2020

Issued Patents 2020

Showing 1–1 of 1 patents

Patent #TitleCo-InventorsDate
10875144 Chemical mechanical polishing pad Bainian Qian, Fengji Yeh, Sheng-Huan Tseng, Kevin Wen-Huan Tung, Marty W. DeGroot 2020-12-29