SH

Stefan Hembacher

CG Carl Zeiss Smt Gmbh: 2 patents #22 of 200Top 15%
AB Asml Netherlands B.V.: 1 patents #317 of 801Top 40%
Overall (2020): #119,038 of 565,922Top 25%
2
Patents 2020

Issued Patents 2020

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
10684551 EUV exposure apparatus with reflective elements having reduced influence of temperature variation Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer +7 more 2020-06-16
10599051 Projection exposure apparatus, and method for reducing deformations, resulting from dynamic accelerations, of components of the projection exposure apparatus Erik Loopstra, Jens Kugler, Bernhard Geuppert 2020-03-24