Issued Patents 2020
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10809625 | Intensity adaptation filter for EUV microlithography, method for producing same, and illumination system having a corresponding filter | Ulrich Mueller | 2020-10-20 |
| 10598921 | Mirror element, in particular for a microlithographic projection exposure apparatus | Martin Hermann, Christoph Nottbohm | 2020-03-24 |
| 10545323 | Projection optical unit for EUV projection lithography | Markus Schwab, Thomas Schicketanz | 2020-01-28 |